Fujifilm advances green shift in semiconductor materials
Fujifilm Corporation has announced the development of the world’s first fluorine-free negative ArF immersion photoresist, a key material used in advanced semiconductor manufacturing, marking a significant technological shift in one of the most strategic segments of the global chip supply chain. The new material is designed for advanced nodes used in artificial intelligence semiconductor production, where demand continues to grow rapidly. Fujifilm has already begun providing samples to clients, with early commercialization planned following evaluation. The company positions the innovation as both a performance breakthrough and a response to increasing environmental and regulatory pressure around PFAS-related substances. ArF immersion lithography…
